Influence of rapid thermal annealing on a 30 stack InAs/GaAs quantum dot infrared photodetector

Abstract

Influence of rapid thermal annealing on a 30 stack InAs/GaAs quantum dot infrared photodetector (QDIP) was studied. Temperatures in the range of 600-800°C for 60 s, typical of atomic interdiffusion were used. The devices exhibited large dark currents after rapid thermal annealing.

DOI
10.1063/1.1609634
Year