Unique RIR-MAPLE Techniques Developed by Stiff-Roberts Group
Emulsion Host Matrix
The emulsion host matrix contains a primary solvent, secondary solvent, DI water (containing surfactant).
- Primary solvent is used to dissolve the target organic materials.
- Secondary solvent is mainly used to prevent frozen target sublimation under the vacuum, and also to enrich the OH concentration in the emulsion.
- DI water (containing surfactant) is used to enrich the OH concentration to absorb the laser energy.
Figure 1: Emulsion Host Matrix
Sequential RIR-MAPLE Deposition
Sequential deposition reduces the impact of solubility characteristics of one component on the deposition of another component.
Figure 2: Sequential RIR-MAPLE
R. Pate and A. D. Stiff-Roberts, Chemical Physics Letters, vol. 477, pp. 406-410, August 2009
R. Pate, K. R. Lantz, and A. D. Stiff-Roberts, Thin Solid Films, 517, 6798 (2009).